Quantum confinement effects on the optical properties of ion beam sputtered nickel oxide thin films

被引：15
|
作者：
Krishna, MG [1 ]
Bhattacharya, AK [1 ]
机构：
[1] Univ Warwick, Sch Engn, Warwick Proc Technol Grp, Coventry CV4 7AL, W Midlands, England
来源：
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2001年 / 15卷 / 02期
关键词：
D O I：
10.1142/S0217979201003740
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Quantum confinement effects on the optical properties of ion beam sputtered nickel oxide thin films are reported. Thin films with crystallite sizes in the range 9 to 14 nm have been deposited on to fused silica substrates. There is an increase in band gap, from 3.4 to 3.9 eV, and a decrease in refractive index, from 2.4 to 1.8, with decrease in crystallite size, that can be attributed to quantum confinement effects. The effective mass approximation has been used to explain the observed behaviour in band gap variation.
引用
收藏
页码：191 / 200
页数：10
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