Compositional study of vacuum annealed Al doped ZnO thin films obtained by RF magnetron sputtering

被引：20
|
作者：
Shantheyanda, B. P. [2 ]
Todi, V. O. [2 ]
Sundaram, K. B. [2 ]
Vijayakumar, A. [1 ]
Oladeji, I. [1 ]
机构：
[1] Planar Energy Inc, Orlando, FL 32805 USA
[2] Univ Cent Florida, Dept Elect Engn & Comp Sci, Orlando, FL 32816 USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2011年 / 29卷 / 05期
关键词：
ZINC-OXIDE FILMS; CHEMICAL-VAPOR-DEPOSITION; TRANSPARENT CONDUCTING FILMS; SOL-GEL PROCESS; STRUCTURAL-PROPERTIES; OPTICAL-PROPERTIES; TEMPERATURE; PLASMA; OXYGEN; TARGET;
D O I：
10.1116/1.3624787
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Aluminum doped zinc oxide (AZO) thin films were obtained by RF magnetron sputtering. The effects of deposition parameters such as power, gas flow conditions, and substrate heating have been studied. Deposited and annealed films were characterized for composition as well as microstructure using x ray photoelectron spectroscopy and x ray diffraction. Films produced were polycrystalline in nature. Surface imaging and roughness studies were carried out using SEM and AFM, respectively. Columnar grain growth was predominantly observed. Optical and electrical properties were evaluated for transparent conducting oxide applications. Processing conditions were optimized to obtain highly transparent AZO films with a low resistivity value of 6.67 x 10(-4) Omega cm. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3624787]
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页数：9
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