Secondary electron emission yield from high aspect ratio carbon velvet surfaces

被引:27
|
作者
Jin, Chenggang [1 ,2 ,3 ]
Ottaviano, Angelica [1 ]
Raitses, Yevgeny [1 ]
机构
[1] Princeton Plasma Phys Lab, Princeton, NJ 08543 USA
[2] Soochow Univ, Coll Phys Optoelect & Energy, Suzhou 215006, Peoples R China
[3] Soochow Univ, Collaborat Innovat Ctr Suzhou Nano Sci & Technol, Suzhou 215006, Peoples R China
基金
中国博士后科学基金; 中国国家自然科学基金;
关键词
HALL THRUSTER;
D O I
10.1063/1.4993979
中图分类号
O59 [应用物理学];
学科分类号
摘要
The plasma electrons bombarding a plasma-facing wall surface can induce secondary electron emission (SEE) from the wall. A strong SEE can enhance the power losses by reducing the wall sheath potential and thereby increasing the electron flux from the plasma to the wall. The use of the materials with surface roughness and the engineered materials with surface architecture is known to reduce the effective SEE by trapping the secondary electrons. In this work, we demonstrate a 65% reduction of SEE yield using a velvet material consisting of high aspect ratio carbon fibers. The measurements of SEE yield for different velvet samples using the electron beam in vacuum demonstrate the dependence of the SEE yield on the fiber length and the packing density, which is strongly affected by the alignment of long velvet fibers with respect to the electron beam impinging on the velvet sample. The results of SEE measurements support the previous observations of the reduced SEE measured in Hall thrusters. Published by AIP Publishing.
引用
收藏
页数:5
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