Update of the development progress of the High Power LPP-EUV light source using a magnetic field

被引：1

作者：

Takashima, Yuta ^{[1
]}

Ueno, Yoshifumi ^{[1
]}

Yabu, Takayuki ^{[1
]}

Hori, Tsukasa ^{[1
]}

Soumagne, Georg ^{[1
]}

Nagai, Shinji ^{[1
]}

Yanagida, Tatsuya ^{[1
]}

Shiraishi, Yutaka ^{[1
]}

Miyao, Kenichi ^{[1
]}

Hayashi, Hideyuki ^{[1
]}

Watanabe, Yukio ^{[1
]}

Abe, Tamotsu ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Saito, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2019 | 2019年 / 11147卷

关键词：

EUV light source; EUV lithography; Laser produced plasma; Debris mitigation; Magnetic field; Tin droplet target; CO2; laser; Pre-pulse laser;

D O I：

10.1117/12.2536397

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Gigaphoton Inc. has been developing a CO2-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Key components of the source include a high-power CO2 laser with 15 ns pulse duration and 100 kHz repetition frequency, a solid-state pre-pulse laser with 10 ps pulse duration and a magnetic field debris mitigation system. To achieve 330 W with long collector mirror lifetime and stable output, we improved the performance of key system components; especially, the laser beam quality at 26 kW CO2 laser output power by upgrading the CO2 laser beam transfer system, the conversion efficiency (CE) by the optimization of plasma-related parameters to now 6 %, the dose stability and suppression of small Tin (Sn) debris by upgrading the shooting control system, the collector mirror degradation rate by the optimization of H-2 flow condition and changes in the EUV chamber structure. This paper presents the key technology update of our EUV light source.

引用

页数：13

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