Interfacial fabrication of silica hollow particles in a reverse emulsion system

被引：9
|
作者：
Song, LY [1 ]
Ge, XW [1 ]
Zhang, ZC [1 ]
机构：
[1] Univ Sci & Technol China, Dept Polymer Sci & Engn, Hefei 230026, Anhui, Peoples R China
来源：
CHEMISTRY LETTERS | 2005年 / 34卷 / 10期
关键词：
D O I：
10.1246/cl.2005.1314
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Silica hollow particles were prepared at room temperature in a reverse emulsion system (W/O emulsion) via interfacial strategy. The cationic surfactant cetyltrimethylammonium bromide (CTAB) and aliphatic amine were found to be critical factors for the production of hollow structure.
引用
收藏
页码：1314 / 1315
页数：2
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