ZrO2/SiO2 Two-Layer Antireflective Coatings by Sol-Gel Process

被引:0
|
作者
Li Haiyuan [1 ]
Xiong Huai [1 ]
Tang Yongxing [1 ]
Hu Lili [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, High Power Laser Phys Natl Lab, Shanghai 201800, Peoples R China
关键词
sol-gel; thin film; ZrO2/SiO2; two-layer antireflective; LASER DAMAGE THRESHOLD; HR MIRRORS; CHEMISTRY;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A kind of lambda/4-lambda/4 ZrO2/SiO2 two-layer antireflective (AR) coatings was developed by sol-gel dip-coating method with zirconium n-propoxide and tetraethoxysilane (TEOS) as the precursors. The ZrO2 sol was prepared from the solution containing zirconium n-propoxide, hydrochloric acid and acetylacetone in ethanol. The results indicate the stability of the ZrO2 sol. The transmission of ZrO2/SiO2 two-layer AR coatings was 99.41% on fused silica substrate at 351 nm and about 99.63% on the BK-7 glass substrate at 1053 nm. The root mean square (RMS) of surface roughness was 1.038 nm in ZrO2/SiO2 AR coatings. The laser induced damage thresholds (LIDTs) of ZrO2 coating was 19.6 J/cm(2) (1064 nm, 1 ns), and the LIDTs of ZrO2/SiO2 AR coatings was 16.8 J/cm(2) (1064 nm, 1 ns).
引用
收藏
页码:145 / 148
页数:4
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