DC glow discharge for sputtering & biasing

被引：0
|
作者：
Mattox, DM [1 ]
机构：
[1] Soc Vacuum Coaters, Albuquerque, NM 87122 USA
来源：
PLATING AND SURFACE FINISHING | 2000年 / 87卷 / 12期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
1
引用
收藏
页码：63 / 65
页数：3
相关论文
共 50 条
  • [21] Sputtering in a glow discharge lamp of the Grimm type
    Grais, KI
    Eid, MA
    Al-Ashkar, EA
    Eid, KA
    Abd-El-Aal, MS
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2003, 21 (03): : 213 - 223
  • [22] CAPACITANCE AND IMPEDANCE OF GLOW DISCHARGE IN RF SPUTTERING
    TSUI, RTC
    VACUUM, 1968, 18 (03) : 150 - &
  • [23] RF GLOW-DISCHARGE SPUTTERING MODEL
    LOGAN, JS
    KELLER, JH
    SIMMONS, RG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 92 - 97
  • [24] SPUTTERING RATES OF ALLOYS IN GLOW-DISCHARGE
    REN, JS
    ZHANG, GS
    WANG, ZS
    ZHAO, JW
    JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 1995, 11 (04) : 295 - 298
  • [25] The DC glow discharge at atmospheric pressure
    Goossens, O
    Callebaut, T
    Akishev, Y
    Napartovich, A
    Trushkin, N
    Leys, C
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2002, 30 (01) : 176 - 177
  • [26] Chapter 3 dc Glow Discharge
    Uchida, Yoshiyuki
    Semiconductors and Semimetals, 1984, 21 (PART A) : 41 - 54
  • [27] ON PERIODICAL PHENOMENA IN A DC GLOW DISCHARGE
    SANDULOVICIU, M
    ZEITSCHRIFT FUR PHYSIK, 1969, 225 (03): : 248 - +
  • [28] Electrical characteristics of a DC glow discharge
    Garamoon, AA
    Samir, A
    Elakshar, FF
    Kotp, EF
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2003, 12 (03): : 417 - 420
  • [29] Guiding DC glow discharge in microchannels
    Lim, J
    Reyes, DR
    Manz, A
    LAB ON A CHIP, 2003, 3 (03): : 137 - 140
  • [30] Dusty plasmas in a dc glow discharge
    Fortov, VE
    Nefedov, AP
    Molotkov, VI
    Petrov, OF
    Poustylnik, MY
    Torchinsky, VM
    Khrapak, AG
    DUSTY PLASMAS IN THE NEW MILLENNIUM, 2002, 649 : 394 - 397
12345