Hole mobility and antiferromagnetic correlations in underdoped La2-xSrxCuO4 high-Tc cuprate explained

被引：0
|
作者：
Burris, JL
机构：
来源：
MRS BULLETIN | 2001年 / 26卷 / 08期
关键词：
D O I：
10.1557/mrs2001.161
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
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页码：595 / 595
页数：1
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