Effect of rf sputtering on morphological and semiconductor properties of thin films of Yba2Cu3O7-δ

被引:0
|
作者
Acosta, M
Arés, O
Sosa, V
Acosta, C
Ceh, O
机构
[1] Inst Politecn Nacl, Ctr Invest & Estudios Avanzados, Dept Fis Aplicada, Merida 97310, Yucatan, Mexico
[2] Univ Havana, Fac Fis, Inst Mat & Reactivos Elect, Lab Superconductividad, Havana, Cuba
关键词
YBCO; thin films; ion bombardment; rf sputtering;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Using an off-axis configuration we have prepared in situ superconducting YBa2Cu3O7-delta (YBCO) thin films on SrTiO3 single-crystal (100) substrates. We have studied the effect of the distance from the target-substrate on the critical temperature (T-c) and current density (J(c)) of our films. Our best samples had T-c similar to 85 K and J(c) similar to 10(6) A/cm(2) at 20 K. Surface topography was examined by atomic force microscopy (AFM) and scanning electron microscopy (SEM), showing the growth of spiral-shaped terraces. The height between steps was of the order of the c-axis length. Samples grown at not optimized positions presented non superconducting regions. The damage of this regions was related to the bombardment of negative oxygen ions or highly-energetic particles present in the plasma.
引用
收藏
页码:260 / 264
页数:5
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