Reduction of higher-order photobleaching in two-photon excitation microscopy

被引:13
|
作者
Mondal, Partha Pratim
Diaspro, Alberto
机构
[1] Abdus Salaam Int Ctr Theoret Phys, Trieste, Italy
[2] Univ Genoa, Dept Phys, Genoa, Italy
[3] IFOM IEO, Milan, Italy
来源
PHYSICAL REVIEW E | 2007年 / 75卷 / 06期
关键词
D O I
10.1103/PhysRevE.75.061904
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A theoretical microscopic technique is proposed that may reduce multiphoton interaction in the excitation volume of a two-photon microscope. Since higher-order photobleaching is common in two-photon excitation microscopy, the study of thin samples is limited by increased photobleaching and photodamage. This limitation is elevated by using even coherent state light. The advantage of even coherent state light is that only excitation due to an even number of photons can survive. The very first nonzero even excitation (two-photon) can be isolated from the nearby one- and three-photon excitation. Hence the photobleaching due to one- and three-photon excitation can be eliminated and higher-order processes can be minimized owing to their small molecular cross section.
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页数:4
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