Novel Polarization Beam Splitter with High Fabrication Tolerance

被引：0
|
作者：
Abadia, Nicolas [1 ,2 ,4 ]
Dai, Xiangyang [3 ]
Lu, Qiaoyin [3 ]
Guo, Wei-Hua [3 ]
Saber, Md. Ghulam [4 ]
Plant, David V. [4 ]
Donegan, John F. [1 ,2 ]
机构：
[1] Trinity Coll Dublin, Sch Phys, Semicond Photon Grp, Dublin 2, Ireland
[2] Trinity Coll Dublin, CRANN, Dublin 2, Ireland
[3] Huazhong Univ Sci & Technol, Wuhan Natl Lab Optoelect, Wuhan 430074, Peoples R China
[4] McGill Univ, Dept Elect & Comp Engn, Montreal, PQ H3A 0E9, Canada
来源：
2018 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2018年
关键词：
INDEX; INP;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A highly fabrication tolerant polarization beam splitter is presented. The fabrication tolerances are relaxed by adjusting two voltages. Experiments show on-chip losses of 3.5 dB and extinction ratio of 15 dB at C-band.
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收藏
页数：2
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