Ultrafast thermal diffusion and relaxation in amorphous silicon films

被引:0
|
作者
Wright, OB [1 ]
Zammit, U [1 ]
Marinelli, M [1 ]
Gusev, VE [1 ]
机构
[1] CNR,IST ACUST OM CORBINO,I-00189 ROME,ITALY
关键词
D O I
暂无
中图分类号
O42 [声学];
学科分类号
070206 ; 082403 ;
摘要
引用
收藏
页码:341 / 342
页数:2
相关论文
共 50 条
  • [41] Silicon network relaxation in amorphous hydrogenated silicon
    Remes, Z
    Vanecek, M
    Mahan, AH
    Crandall, RS
    PHYSICAL REVIEW B, 1997, 56 (20): : 12710 - 12713
  • [42] Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experiments
    Kail, F.
    Farjas, J.
    Roura, P.
    Secouard, C.
    Nos, O.
    Bertomeu, J.
    Alzina, F.
    Roca i Cabarrocas, P.
    APPLIED PHYSICS LETTERS, 2010, 97 (03)
  • [43] THERMAL RELAXATION OF THE ELECTRIC-CONDUCTIVITY IN AMORPHOUS SILICON-GERMANIUM ALLOYS
    LIU, JZ
    CHU, V
    SHEN, DS
    SLOBODIN, D
    WAGNER, S
    PHYSICAL REVIEW B, 1989, 40 (09): : 6424 - 6427
  • [44] INFLUENCE OF ILLUMINATION DURING THERMAL QUENCHING AND RELAXATION IN UNDOPED AMORPHOUS-SILICON
    MEAUDRE, M
    MEAUDRE, R
    PHYSICAL REVIEW B, 1992, 45 (08): : 4524 - 4527
  • [45] THERMAL DIFFUSION OF SODIUM IN SILICON NITRIDE-SHIELDED SILICON OXIDE FILMS
    BURGESS, TE
    BAUM, JC
    FOWKES, FM
    HOLMSTRO.R
    SHIRN, GA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) : C69 - &
  • [46] FEMTOSECOND SPECTROSCOPIC STUDY OF ULTRAFAST CARRIER RELAXATION IN HYDROGENATED AMORPHOUS-SILICON A-SI-H
    ESSER, A
    HEESEL, H
    KURZ, H
    WANG, C
    PARSONS, GN
    LUCOVSKY, G
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (03) : 1235 - 1239
  • [47] ULTRAFAST RECOMBINATION AND TRAPPING IN AMORPHOUS-SILICON
    ESSER, A
    SEIBERT, K
    KURZ, H
    PARSONS, GN
    WANG, C
    DAVIDSON, BN
    LUCOVSKY, G
    NEMANICH, RJ
    PHYSICAL REVIEW B, 1990, 41 (05): : 2879 - 2884
  • [48] Ultrafast carrier thermalization in hydrogenated amorphous silicon
    Dexheimer, SL
    Zhang, CP
    Liu, J
    Young, JE
    Nelson, BP
    AMORPHOUS AND HETEROGENEOUS SILICON-BASED FILMS-2002, 2002, 715 : 269 - 273
  • [49] ULTRAFAST RECOMBINATION AND TRAPPING IN AMORPHOUS-SILICON
    ESSER, A
    SEIBERT, K
    KURZ, H
    PARSONS, GN
    WANG, C
    DAVIDSON, BN
    LUCOVSKY, G
    NEMANICH, RJ
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1989, 114 : 573 - 575
  • [50] Dopant diffusion in amorphous silicon
    Duffy, R
    Venezia, VC
    Heringa, A
    Hopstaken, MJP
    Maas, GCJ
    Dao, T
    Tamminga, Y
    Roozeboom, F
    SILICON FRONT-END JUNCTION FORMATION-PHYSICS AND TECHNOLOGY, 2004, 810 : 437 - 442