Enhancing the soft magnetic properties of FeGa with a non-magnetic underlayer for microwave applications
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作者:
Acosta, Adrian
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Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Acosta, Adrian
[1
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Fitzell, Kevin
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Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Fitzell, Kevin
[1
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Schneider, Joseph D.
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Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Schneider, Joseph D.
[2
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Dong, Cunzheng
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Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Dong, Cunzheng
[3
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Yao, Zhi
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Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Yao, Zhi
[4
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Wang, Yuanxun Ethan
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Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Wang, Yuanxun Ethan
[4
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Carman, Gregory P.
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Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Carman, Gregory P.
[2
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Sun, Nian X.
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Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Sun, Nian X.
[3
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Chang, Jane P.
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Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Chang, Jane P.
[1
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机构:
[1] Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
[2] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA
[3] Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USA
[4] Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
An ultra-thin (similar to 2.5nm) non-magnetic Cu underlayer was found to have a significant effect on the microstructure, magnetic softness, and magnetostriction of sputter-deposited Fe81Ga19 (FeGa) thin films. Compared to the experimental control where FeGa was deposited directly on Si without an underlayer, the presence of Cu increased the in-plane uniaxial anisotropy of FeGa and reduced the in-plane coercivity by nearly a factor of five. The effective Gilbert damping coefficient was also significantly reduced by a factor of four, between FeGa on Si and FeGa on a Cu underlayer. The FeGa films on Cu also retained a high saturation magnetostriction comparable to those without an underlayer. The enhancement of the desirable magnetic properties for microwave applications is attributed to the Cu underlayer, promoting the (110) film texture and increasing the compressive film strain. The results demonstrated that the structural control is viable to simultaneously achieve the necessary magnetic softness and magnetostriction in FeGa for integration in strain-mediated magnetoelectric and microwave devices.
机构:
Hitachi Met Ltd, Magnet & Elect Mat Res Lab, Kumagaya, Saitama 3600843, JapanHitachi Met Ltd, Magnet & Elect Mat Res Lab, Kumagaya, Saitama 3600843, Japan