p-Type conduction in stacking-fault-free m-plane GaN

被引:46
|
作者
McLaurin, Melvin [1 ]
Speck, James S. [1 ]
机构
[1] Univ Calif Santa Barbara, Dept Mat, JST ERATO Grp, Santa Barbara, CA 93106 USA
来源
关键词
12;
D O I
10.1002/pssr.200701041
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transport measurements of p-type m-plane GaN films grown on low extended-defect density, free-standing m-plane (10 (1) over bar0) GaN substrates are presented. No significant anisotropy in in-plane mobility was found for hole concentrations between 2.45 x 10(17) and 8.7 x 10(18) cm(-3). Since faulted, heteroepitaxial m-plane films showed significant anisotropy in electron and hole mobility a microstructural feature with anisotropic distribution (basal plane stacking faults) is discussed as a possible source of anisotropic scattering in non-polar and semi-polar films. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:110 / 112
页数:3
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