Ion irradiation effects on the optical properties of tungsten oxide films

被引：2

作者：

Nagata, S. ^{[1
]}

Fujita, H.

Inouye, A. ^{[2
]}

Yamamoto, S. ^{[2
]}

Tsuchiya, B.

Shikama, T.

机构：

[1] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan

[2] Japan Atom Energy Agcy, Takasaki, Gunma 3701292, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2010年 / 268卷 / 19期

关键词：

Ion irradiation; Oxygen; Tungsten oxide; Optical absorption; WO3; COLORATION;

D O I：

10.1016/j.nimb.2010.05.076

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The optical changes in amorphous WO3 film prepared by reactive RF sputtering and irradiated by 200-800 key oxygen ions were measured to study the relationship between coloration and energy deposition. The color centers were effectively created by ion irradiation with contributions from nuclear collisions and electronic energy loss. The increase in the absorption coefficient was reasonably explained by a first order reaction, whose production rate depended roughly on the total deposited energy. During heat treatment in air atmosphere, transmittance recovery started at 400 K and completed at 550 K. No significant difference was found among films irradiated by different incident energies: therefore indicating that the ion-induced damage structure is not strongly influenced by the type of energy loss. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：3151 / 3154

页数：4

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