共 50 条
- [1] New KrF and ArF excimer lasers for advanced deep ultraviolet optical lithography Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (8 A): : 4050 - 4054
- [2] NEW KRF AND ARF EXCIMER LASERS FOR ADVANCED DEEP-ULTRAVIOLET OPTICAL LITHOGRAPHY JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (8A): : 4050 - 4054
- [4] Operation of KrF and ArF tunable excimer lasers without Cassegrain optics Appl Phys B, 3 (241-247):
- [5] Operation of KrF and ArF tunable excimer lasers without Cassegrain optics APPLIED PHYSICS B-LASERS AND OPTICS, 1996, 62 (03): : 241 - 247
- [6] Hollow fiber delivery of ArF and KrF excimer laser light SPECIALTY FIBER OPTICS FOR MEDICAL APPLICATIONS, PROCEEDINGS OF, 1999, 3596 : 2 - 7
- [9] PERFORMANCE OF 0.2 MU-M OPTICAL LITHOGRAPHY USING KRF AND ARF EXCIMER-LASER SOURCES JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2692 - 2696
- [10] High efficient electric-discharge ArF and KrF excimer lasers with He as a buffer gas CLEO(R)/PACIFIC RIM 2001, VOL II, TECHNICAL DIGEST, 2001, : 62 - 63