Angular effect in laser removal of spherical silica particles from silicon wafers

被引:12
|
作者
Zheng, YW
Lu, YF
Song, WD
机构
[1] Natl Univ Singapore, Dept Elect Engn, Laser Microproc Lab, Singapore 119260, Singapore
[2] Natl Univ Singapore, Data Storage Inst, Singapore 119260, Singapore
关键词
D O I
10.1063/1.1359154
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, laser cleaning efficiencies to remove 2.5 mum particles have been investigated with different incident angles ranging from 0 degrees to 60 degrees. It is found that when the laser light irradiated normally to the substrate surface, the particle could be removed most efficiently. In this direction, the cleaning efficiency was also most sensitive to the light intensity. A sharp drop of cleaning efficiency occurred with a small change of the incident angle. Theoretical calculations based on the Lorentz-Mie theory and an accurate solution of the boundary problem, indicate that the light intensity near the contacting point is sensitive to the incident angle even though the incident light is uniform. (C) 2001 American Institute of Physics.
引用
收藏
页码:59 / 63
页数:5
相关论文
共 50 条
  • [1] Laser induced removal of spherical particles from silicon wafers
    Lu, Y.F.
    Zheng, Y.W.
    Song, W.D.
    1600, American Institute of Physics Inc. (87):
  • [2] Laser induced removal of spherical particles from silicon wafers
    Lu, YF
    Zheng, YW
    Song, WD
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (03) : 1534 - 1539
  • [3] Effect of wavelength and incident angle in the laser removal of particles from silicon wafers
    Curran, C
    Watkins, KG
    Lee, JM
    20TH ICALEO 2001, VOLS 92 & 93, CONGRESS PROCEEDINGS, 2001, : 79 - 86
  • [4] Ultraviolet laser removal of small metallic particles from silicon wafers
    Curran, C
    Lee, JM
    Watkins, KG
    OPTICS AND LASERS IN ENGINEERING, 2002, 38 (06) : 405 - 415
  • [5] Laser-assisted removal of particles on silicon wafers
    Vereecke, G
    Röhr, E
    Heyns, MM
    JOURNAL OF APPLIED PHYSICS, 1999, 85 (07) : 3837 - 3843
  • [6] Laser assisted particle removal from silicon wafers
    Mosbacher, M
    Münzer, HJ
    Bertsch, M
    Dobler, V
    Chaoui, N
    Siegel, J
    Oltra, R
    Bäuerle, D
    Boneberg, J
    Leiderer, P
    PARTICLES OF SURFACES 7: DETECTION, ADHESION AND REMOVAL, 2002, : 275 - 293
  • [7] Laser removal of copper particles from silicon wafers using UV, visible and IR radiation
    Lee, JM
    Curran, C
    Watkins, KG
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2001, 73 (02): : 219 - 224
  • [8] Laser removal of copper particles from silicon wafers using UV, visible and IR radiation
    J.M. Lee
    C. Curran
    K.G. Watkins
    Applied Physics A, 2001, 73 : 219 - 224
  • [9] Laser cleaning of particles from silicon wafers: capabilities and mechanisms
    Graf, J
    Lang, F
    Mosbacher, M
    Leiderer, P
    ULTRA CLEAN PROCESSING OF SILICON SURFACES VII, 2005, 103-104 : 185 - 188
  • [10] Laser-induced particle removal from silicon wafers
    Leiderer, P
    Boneberg, J
    Dobler, V
    Mosbacher, M
    Münzer, HJ
    Chaoui, N
    Siegel, J
    Solis, J
    Afonso, CN
    Fourrier, T
    Schrems, G
    Bäuerle, D
    HIGH-POWER LASER ABLATION III, 2000, 4065 : 249 - 259