EUV diagnostics of pulsed plasma systems

被引：0

作者：

Mohanty, S. R. ^{[1
]}

Hotta, E. ^{[2
]}

机构：

[1] Ctr Plasma Phys, Kamrup 782402, Assam, India

[2] Tokyo Inst Technol, Dept Energy Sci, Yokohama, Kanagawa 2268502, Japan

来源：

23RD NATIONAL SYMPOSIUM ON PLASMA SCIENCE AND TECHNOLOGY (PLASMA-2008) | 2010年 / 208卷

关键词：

EXTREME-ULTRAVIOLET EMISSION; HIGHLY IONIZED XENON; LIGHT-SOURCE; LITHOGRAPHY; PERFORMANCE; RADIATION; SPECTRA;

D O I：

10.1088/1742-6596/208/1/012138

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Extreme ultraviolet (EUV) diagnostics have been a subject of continuing interest for last several decades in the field of space and plasma sciences. In recent days, EUV diagnostics are being widely employed in the laboratories and industries to characterize EUV emission from the EM radiation sources that have strong impacts on future technology. This paper gives description of some of the important EUV diagnostics such as EUV photon detector, EUV energy measurement system, EUV pinhole camera, grazing incidence spectrograph and transmission grating spectrograph employed at Tokyo Institute of Technology to characterize EUV emission from the low current (<15 kA) and low energy (similar to ten of Joule) pulsed plasma systems and some typical results.

引用

页数：8

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