Periodic layered structure in Ni3Si/Zn diffusion couples

被引：26
|
作者：
He, Meng [1 ]
Su, Xuping [1 ,1 ]
Yin, Fucheng [1 ]
Wang, Jianhua [1 ]
Li, Zhi [1 ]
机构：
[1] Xiangtan Univ, Key Lab Mat Design & Preparat Technol Hunan Provi, Hunan 411105, Peoples R China
来源：
SCRIPTA MATERIALIA | 2008年 / 59卷 / 04期
基金：
中国国家自然科学基金;
关键词：
periodic layered structure; ternary diffusion couples; reactive diffusion zone;
D O I：
10.1016/j.scriptamat.2008.04.015
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
During the reaction in Ni3Si/Zn ternary diffusion couples at temperatures between 390 and 450 degrees C the formation of a periodic layered structure was observed. The periodic layered structure was determined by using scanning electron microscopy coupled with energy dispersive X-ray spectroscopy and X-ray diffraction. It consists of parallel alternating layers: a ternary phase T (Ni(2)Zn(3)si) layer and the gamma (NiZn3) phase layer. A model describing the formation of such a layered structure in the Ni3Si/Zn system is presented. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：411 / 413
页数：3
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