Avalanche multiplication phenomenon in amorphous semiconductors: Amorphous selenium versus hydrogenated amorphous silicon

被引:48
|
作者
Reznik, A. [1 ]
Baranovskii, S. D.
Rubel, O.
Juska, G.
Kasap, S. O.
Ohkawa, Y.
Tanioka, K.
Rowlands, J. A.
机构
[1] Sunnybrook Hlth Sci Ctr, Toronto, ON M4N 3M5, Canada
[2] Univ Marburg, Dept Phys, D-35032 Marburg, Germany
[3] Univ Marburg, Ctr Mat Sci, D-35032 Marburg, Germany
[4] Vilnius State Univ, Fac Phys, LT-10222 Vilnius, Lithuania
[5] Univ Saskatchewan, Dept Elect Engn, Saskatoon, SK S7N 5A9, Canada
[6] NHK Japan Broadcasting Corp, Sci & Tech Res Labs, Satagaya Ku, Tokyo 1578510, Japan
[7] Toronto Sunnybrook Reg Canc Ctr, Toronto, ON M4N 3M5, Canada
基金
加拿大健康研究院;
关键词
D O I
10.1063/1.2776223
中图分类号
O59 [应用物理学];
学科分类号
摘要
Although the effect of the impact ionization and the consequent avalanche multiplication in amorphous selenium (a-Se) was established long ago and has led to the development and commercialization of ultrasensitive video tubes, the underlying physics of these phenomena in amorphous semiconductors has not yet been fully understood. In particular, it is puzzling why this effect has been evidenced at practical electric fields only in a-Se among all amorphous materials. For instance, impact ionization seems much more feasible in hydrogenated amorphous silicon (a-Si:H) since the charge carrier mobility in a-Si:H is much higher than that in a-Se and also the amount of energy needed for ionization of secondary carriers in a-Si:H is lower than that in a-Se. Using the description of the avalanche effect based on the lucky-drift model recently developed for amorphous semiconductors we show how this intriguing question can be answered. It is the higher phonon energy in a-Si:H than that in a-Se, which is responsible for the shift of the avalanche threshold in a-Si:H to essentially higher fields as compared to a-Se. (C) 2007 American Institute of Physics.
引用
收藏
页数:7
相关论文
共 50 条
  • [31] CNDO APPROACH TO AMORPHOUS-SILICON AND TO HYDROGENATED AND FLUORINATED AMORPHOUS-SILICON
    TAGUENAMARTINEZ, J
    SANSORES, LE
    CETINA, EA
    PHYSICAL REVIEW B, 1983, 27 (04): : 2435 - 2438
  • [32] Anomalous enhancement in radiation induced conductivity of hydrogenated amorphous silicon semiconductors
    Sato, Shin-ichiro
    Sai, Hitoshi
    Ohshima, Takeshi
    Imaizumi, Mitsuru
    Shimazaki, Kazunori
    Kondo, Michio
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2012, 286 : 29 - 34
  • [33] Optical limiting in hydrogenated amorphous silicon-selenium thin films
    Manaa, Hacene
    Al-Mulla, Abdullah
    Al-Jamal, Noor
    Al-Dallal, Shawqi
    Al-Alawi, Saleh
    THIN SOLID FILMS, 2010, 518 (14) : 3933 - 3937
  • [34] PROPERTIES OF BONDED HYDROGEN IN HYDROGENATED AMORPHOUS-SILICON AND OTHER HYDROGENATED AMORPHOUS-SILICON ALLOYS
    LUCOVSKY, G
    JING, Z
    LU, Z
    LEE, DR
    WHITTEN, JL
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 182 (1-2) : 90 - 102
  • [35] X-ray imaging using avalanche multiplication in amorphous selenium: Investigation of intrinsic avalanche noise
    Hunt, D. C.
    Tanioka, Kenkichi
    Rowlands, J. A.
    MEDICAL PHYSICS, 2007, 34 (12) : 4654 - 4663
  • [36] Excess noise in amorphous Selenium avalanche photodiodes
    Ohshima, Tetsuya
    Tsuji, Kazutaka
    Sameshima, Kenji
    Hirai, Tadaaki
    Shidara, Keiichi
    Taketoshi, Kazuhisa
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1991, 30 (6 B): : 1071 - 1074
  • [37] Picosecond Time Resolution with Avalanche Amorphous Selenium
    LaBella, Andy
    Stavro, Jann
    Leveille, Sebastien
    Zhao, Wei
    Goldan, Amir H.
    ACS PHOTONICS, 2019, 6 (06): : 1338 - 1344
  • [38] Growth mechanism of hydrogenated amorphous silicon
    Robertson, J
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 : 79 - 83
  • [39] Nanostructural disorder in hydrogenated amorphous silicon
    Sava, F.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2007, 9 (09): : 2963 - 2966
  • [40] IMPURITY DIFFUSION IN AMORPHOUS HYDROGENATED SILICON
    KUDOYAROVA, VK
    KULIKOV, GS
    TERUKOV, EI
    KHODZAEV, KK
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 90 (1-3) : 211 - 214