Structural and electrical properties of metastable defects in hydrogenated amorphous silicon

被引:22
|
作者
Melskens, J. [1 ]
Schnegg, A. [2 ]
Baldansuren, A. [2 ]
Lips, K. [2 ]
Plokker, M. P. [3 ]
Eijt, S. W. H. [3 ]
Schut, H. [4 ]
Fischer, M. [1 ]
Zeman, M. [1 ]
Smets, A. H. M. [1 ]
机构
[1] Delft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
[2] Helmholtz Zentrum Berlin Mat & Energie, Berlin Joint EPR lab, Inst Silizium Photovolta, D-12489 Berlin, Germany
[3] Delft Univ Technol, Fac Sci Appl, Fundamental Aspects Mat & Energy, NL-2629 JB Delft, Netherlands
[4] Delft Univ Technol, Fac Sci Appl, Neutron & Positron Methods Mat, NL-2629 JB Delft, Netherlands
关键词
A-SI-H; SPECTRAL DIFFUSION DECAY; SOLAR-CELLS; POSITRON-ANNIHILATION; CONDUCTIVITY CHANGES; DANGLING BONDS; THIN-FILMS; DEGRADATION; GENERATION; STABILITY;
D O I
10.1103/PhysRevB.91.245207
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The structural and electrical properties of metastable defects in various types of hydrogenated amorphous silicon have been studied using a powerful combination of continuous wave electron-paramagnetic resonance spectroscopy, electron spin echo (ESE) decay measurements, and Doppler broadening positron annihilation spectroscopy. The observed dependence of the paramagnetic defect density on the Doppler S parameter indicates that porous, nanosized void-rich materials exhibit higher spin densities, while dense, divacancy-dominated materials show smaller spin densities. However, after light soaking more similar spin densities are observed, indicating a long-term defect creation process in the Staebler-Wronski effect that does not depend on the a-Si: H nanostructure. From ESE decays it appears that there are fast and slowly relaxing defect types, which are linked to various defect configurations in small and large open volume deficiencies. A nanoscopic model for the creation of light-induced defects in the a-Si: H nanostructure is proposed.
引用
收藏
页数:6
相关论文
共 50 条
  • [22] Electrical properties of Cl incorporated hydrogenated amorphous silicon
    Kyung Hee Univ, Seoul, Korea, Republic of
    Sol Energ Mater Sol Cells, 1-4 (61-67):
  • [23] Electrical properties of Cl incorporated hydrogenated amorphous silicon
    Lee, KH
    Kim, SK
    Lee, KS
    Choi, JH
    Kim, CS
    Jang, J
    Pietruszko, SM
    Kostana, M
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1997, 49 (1-4) : 61 - 67
  • [24] Nitrogen-doping effects on electrical, optical, and structural properties in hydrogenated amorphous silicon
    Masuda, A
    Itoh, K
    Matsuda, K
    Yonezawa, Y
    Kumeda, M
    Shimizu, T
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (10) : 6729 - 6737
  • [26] Structural properties of hydrogenated amorphous silicon carbide alloys
    Wang, Y
    Yue, RF
    Liu, LT
    APPLIED SURFACE SCIENCE, 2002, 193 (1-4) : 138 - 143
  • [27] Hydrogenated amorphous silicon nitride: Structural and electronic properties
    Justo, JF
    Mota, FD
    Fazzio, A
    MULTISCALE MODELLING OF MATERIALS, 1999, 538 : 555 - 560
  • [28] PHOTOINDUCED METASTABLE DEFECTS IN AMORPHOUS-SEMICONDUCTORS - COMMUNALITY BETWEEN HYDROGENATED AMORPHOUS-SILICON AND CHALCOGENIDES
    SHIMAKAWA, K
    KONDO, A
    HAYASHI, K
    AKAHORI, S
    KATO, T
    ELLIOTT, SR
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1993, 164 : 387 - 390
  • [29] Comparison of transport and defects properties in hydrogenated polymorphous and amorphous silicon
    Bronner, W
    Kleider, JP
    Brüggemann, R
    Cabarrocas, PR
    Mencaraglia, D
    Mehring, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2002, 299 : 551 - 555
  • [30] PULSED-LIGHT-INDUCED ANNEALING OF METASTABLE DEFECTS IN HYDROGENATED AMORPHOUS-SILICON
    YOON, JH
    PHYSICAL REVIEW B, 1995, 51 (15): : 10221 - 10223