Measurement of residual stress in thin films using the optical microprobe

被引:0
|
作者
Atkinson, A [1 ]
Clarke, DR [1 ]
Jain, SC [1 ]
Pinardi, K [1 ]
Webb, S [1 ]
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2BP, England
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The laser optical microprobe is a powerful tool for studying the spatial variation of residual stress exploiting the sensitivity of Raman and luminescence spectra to the local stress. Here, using two different examples, we consider some issues determining the depth and lateral resolution of these techniques and their use in stress mapping in thin films. The first example involves Raman microprobe studies of a strained GeSi alloy quantum wire structure. The second example involves stress mapping using chromium ion luminescence in alumina films grown by high temperature thermal oxidation of NiAl single crystals.
引用
收藏
页码:513 / 518
页数:4
相关论文
共 50 条
  • [31] Apparatus for the laser-optical measurement of stress in thin films: Results on CuNi
    Bruckner, W
    Griessmann, H
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (10): : 3662 - 3665
  • [32] Residual stress and thermal stress observation in thin copper films
    Hanabusa, T
    Kusaka, K
    Sakata, O
    THIN SOLID FILMS, 2004, 459 (1-2) : 245 - 248
  • [33] Residual stress measurement with optical strain rosettes
    Li, KY
    IUTAM SYMPOSIUM ON ADVANCED OPTICAL METHODS AND APPLICATIONS IN SOLID MECHANICS, 2000, 82 : 145 - 152
  • [34] Novel optical system for residual stress measurement
    不详
    INSIGHT, 2009, 51 (01) : 6 - 6
  • [35] Study on residual stress in viscoelastic thin film using curvature measurement method
    Young Tae Im
    Seung Tae Choi
    Tae Sang Park
    Jae Hyun Kim
    KSME International Journal, 2004, 18 : 12 - 19
  • [36] Study on residual stress in viscoelastic thin film using curvature measurement method
    Im, YT
    Choi, ST
    Park, TS
    Kim, JH
    KSME INTERNATIONAL JOURNAL, 2004, 18 (01): : 12 - 19
  • [37] Study on residual stress in viscoelastic thin film using curvature measurement method
    Im, YT
    Kim, JH
    Choi, ST
    ADVANCES IN ELECTRONIC MATERIALS AND PACKAGING 2001, 2001, : 341 - 346
  • [38] Measurement of residual stress in diamond films obtained using chemical vapor deposition
    Kim, J.G.
    Yu, J.
    Japanese Journal of Applied Physics, Part 2: Letters, 1998, 37 (07):
  • [39] Measurement of residual stress in diamond films obtained using chemical vapor deposition
    Kim, JG
    Yu, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1998, 37 (7B): : L890 - L893
  • [40] MEASUREMENT OF RESIDUAL-STRESS IN MGO THIN-FILMS ON GAAS BY ELECTRON-MICROSCOPY
    DEGRAEF, M
    CLARKE, DR
    APPLIED PHYSICS LETTERS, 1993, 63 (08) : 1044 - 1046