Influence of molecular architecture on the dewetting of thin polystyrene films

被引:76
|
作者
Krishnan, RS
Mackay, ME [1 ]
Hawker, CJ
Van Horn, B
机构
[1] Michigan State Univ, Dept Chem Engn & Mat Sci, E Lansing, MI 48824 USA
[2] IBM Corp, Almaden Res Lab, San Jose, CA 95210 USA
关键词
D O I
10.1021/la0474060
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The control of dewetting for thin polymer films is a technical challenge and of significant academic interest. We have used polystyrene nanoparticles to inhibit dewetting of high molecular weight, linear polystyrene, demonstrating that molecular architecture has a unique effect on surface properties. Neutron reflectivity measurements were used to demonstrate that the nanoparticles were uniformly distributed in the thin (ca. 40 nm) film prior to high temperature annealing, yet after annealing, they were found to separate to the solid substrate, a silanized silicon wafer. Dewetting was eliminated when the nanoparticles separated to form a monolayer or above while below this surface coverage the dewetting dynamics was severely retarded. Blending linear polystyrene of similar molecular weight to the polystyrene nanoparticle with the high molecular weight polystyrene did not eliminate dewetting.
引用
收藏
页码:5770 / 5776
页数:7
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