A technique for producing ordered arrays of metallic nanoclusters by electroless deposition in focused ion beam patterns

Ordered arrays of An nanoclusters have been prepared on Si substrates using a combination of focused ion beam (FIB) surface processing and electroless deposition. Particles varying in size from approximately 30 to 100 nm have been produced in regular grid patterns whose geometry is controlled to high precision by the FIB. Potential applications range from engineering of the surface plasmon resonance for numerous optical applications to building structures for tethering organic molecules in specific geometric arrangements.