Fabrication of thin self-supporting platinum targets using evaporation techniques

被引:14
|
作者
Singh, Varinderjit [1 ]
Abhilash, S. R. [2 ]
Behera, B. R. [1 ]
Kabiraj, D. [2 ]
机构
[1] Panjab Univ, Dept Phys, Chandigarh 160014, India
[2] Inter Univ Accelerator Ctr, New Delhi 110067, India
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2011年 / 635卷 / 01期
关键词
Platinum (Pt); Copper (Cu); Self-supporting target; Evaporation technique;
D O I
10.1016/j.nima.2011.01.122
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Thin self-supporting isotopic platinum (Pt) targets of 130-200 mu g/cm(2) thickness have been prepared by evaporation technique, using selective etching and parting reagent methods. The evaporation yield of the selective etching method was higher in comparison to the parting reagent method. Further, the purity of targets formed has been accessed by the Energy Dispersive X-ray Fluorescence (EDXRF) and Elastic Recoil Detection Analysis (ERDA) techniques. The analysis indicated that the targets prepared by the selective etching method contain 2 wt% of Cu. Contamination of C was found to be 2.5 wt% in the targets prepared by both of these methods. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:20 / 23
页数:4
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