Low-threshold whispering-gallery dye lasers by planar and 3D lithography on silicon

被引：0
|
作者：
Grossmann, Tobias [1 ,2 ]
Schleede, Simone [1 ]
Hauser, Mario [1 ]
Beck, Torsten [1 ]
Thiel, Michael [1 ]
von Freymann, Georg [1 ,3 ]
Mappes, Timo [2 ]
Kalt, Heinz [1 ]
机构：
[1] Karlsruhe Inst Technol, Inst Appl Phys, D-76128 Karlsruhe, Germany
[2] Karlsruhe Inst Technol, Inst Microstruct Technol, D-76128 Karlsruhe, Germany
[3] Karlsruhe Inst Technol, Inst Nanotechnol, D-76021 Karlsruhe, Germany
来源：
2011 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2011年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We report on the planar and three-dimensional (3D) lithographic fabrication and optical characterization of microcavity lasers made of polymers doped with dyes with laser thresholds as low as 3 nJ per pulse at visible wavelengths. (C)2010 Optical Society of America
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页数：2
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