Small pulsed electron-ion sources for radiation technologies and surface modification of materials

被引：9
|
作者：
Korenev, SA [1 ]
Perry, AJ [1 ]
机构：
[1] ISM TECHNOL INC,SAN DIEGO,CA 92131
来源：
VACUUM | 1996年 / 47卷 / 09期
关键词：
D O I：
10.1016/0042-207X(96)00133-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A new type of small, combined pulsed electron-ion source for radiation technologies and surface modification of materials is reported. The source consists of a high voltage generator and particle emitter in the form of a vacuum diode. Explosive electron emission is used for production of electron beams and explosive ion emission for production of ion beams. The main parameters are the source output are: kinetic energy 200-700 keV, pulse length 0.3-1.0 mu s, electron beam current 0.5-6 kA, ion beam current 0.1-200 A for ions of various conducting materials. The main applications of the device are presented. Copyright (C) 1996 Elsevier Science Ltd.
引用
收藏
页码：1089 / 1092
页数：4
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