Small pulsed electron-ion sources for radiation technologies and surface modification of materials

A new type of small, combined pulsed electron-ion source for radiation technologies and surface modification of materials is reported. The source consists of a high voltage generator and particle emitter in the form of a vacuum diode. Explosive electron emission is used for production of electron beams and explosive ion emission for production of ion beams. The main parameters are the source output are: kinetic energy 200-700 keV, pulse length 0.3-1.0 mu s, electron beam current 0.5-6 kA, ion beam current 0.1-200 A for ions of various conducting materials. The main applications of the device are presented. Copyright (C) 1996 Elsevier Science Ltd.