Multiple-wave lateral shearing interferometry for wave-front sensing

被引:128
|
作者
Chanteloup, JC [1 ]
机构
[1] Univ Paris 06, Ecole Polytech, Comissariat Energie Atom, CNRS,UMR 7605,Lab Utilisat Lasers Intenses, F-91128 Palaiseau, France
关键词
D O I
10.1364/AO.44.001559
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Multiple-wave achromatic interferometric techniques are used to measure, with high accuracy and high transverse resolution, wave fronts of polychromatic light sources. The wave fronts to be measured are replicated by a diffraction grating into several copies interfering together, leading to an interference pattern. A CCD detector located in the vicinity of the grating records this interference pattern. Some of these wave-front sensors are able to resolve wave-front spatial frequencies 3 to 4 times higher than a conventional Shack-Hartmann technique using an equivalent CCD detector. Its dynamic is also much higher, 2 to 3 orders of magnitude. (c) 2005 Optical Society of America.
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页码:1559 / 1571
页数:13
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