Metal contacts to p-type crystalline CuInSe2

被引:0
|
作者
Park, Sunyoung [1 ]
Champness, Clifford H. [1 ]
Mi, Zetian [1 ]
Shih, Ishiang [1 ]
机构
[1] McGill Univ, Quebec City, PQ, Canada
来源
PHOTONICS NORTH 2011 | 2011年 / 8007卷
关键词
contact resistance; ternary semiconductors; semiconductor metal boundaries; metal contacts; P-CUINSE2;
D O I
10.1117/12.905162
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Bilayers of metal contacts were deposited on p-type monocrystalline copper indium diselenide (CuInSe2) and the resistance between two contacts were measured to find low resistance metal contacts on crystalline CuInSe2. The first metal layer was Ni, Pt, Se, or Te and the second metal layer was Au, Ag, Al or Cu. It was observed that the resistance reduced when the surface of crystalline CuInSe2 were etched before metal deposition with a solution containing H2SO4 (1 %, w/w) and CrO3 (1 %, w/w). It was confirmed that the resistance increases after heat- treatments at high temperature. The stability of the metal contacts in room air was estimated from the resistance measured for a period of over 20 days.
引用
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页数:6
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