Reducing the thermal expansion anisotropy in Mo5Si3 by Nb and V additions:: theory and experiment

被引:40
|
作者
Fu, CL [1 ]
Schneibel, JH [1 ]
机构
[1] Oak Ridge Natl Lab, Div Met & Ceram, Oak Ridge, TN 37831 USA
关键词
intermetallic compounds; Ab initio calculation; theory and modeling (structural behavior); thermal expansion;
D O I
10.1016/S1359-6454(03)00358-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Mo5Si3 exhibits a high anisotropy of its coefficients of thermal expansion (CTEs) in the a and c directions, i.e., CTE(c)/CTE(a) = 2.0. The high CTE anisotropy is due to the existence of prominent atom chains along the c-axis. Ternary alloying additions that effectively stretch the atom chains are likely to reduce the bonding directionality/strength and CTE anisotropy. First-principles local-density-functional calculations were carried out for two alloy systems, MoNb4Si3 and Mo4VSi3. Indeed, we find a significant reduction of the CTE ratio to a value of 1.5 for MoNb4Si3 and a value close to 1.0 for Mo4VSi3. The decrease in the CTE anisotropy mainly comes from the reduction in CTE in the c-direction. While a conventional approach to reduce the CTE would involve an increase in lattice rigidity by increasing the bond strength, our strategy focuses on the reduction of driving force for thermal expansion by decreasing the bond directionality. (C) 2003 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:5083 / 5092
页数:10
相关论文
共 50 条
  • [31] PREPARATION OF AMORPHOUS Mo5Si3 BY MECHANICAL ALLOYING AND THE CRYSTALLIZATION
    Li Mingwei
    Tang Renzheng
    Li Wenxian(Department of Materials Science and Engineering
    Transactions of Nonferrous Metals Society of China, 1995, (04) : 118 - 121
  • [32] Preparation of amorphous Mo5Si3 by mechanical alloying and the crystallization
    Li, MW
    Tang, RZ
    Li, WX
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 1995, 5 (04) : 118 - 121
  • [33] The effects of substitution of Cr for Mo on the mechanical properties of nanocrystalline Mo5Si3 films
    Xu, Jiang
    Wang, Yue
    Jiang, Shuyun
    NANOSCALE, 2010, 2 (03) : 394 - 398
  • [34] Microstructure and growth kinetics of the Mo5Si3 and Mo3Si layers in MoSi2/Mo diffusion couple
    Yoon, JK
    Lee, JK
    Lee, KH
    Byun, JY
    Kim, GH
    Hong, KT
    INTERMETALLICS, 2003, 11 (07) : 687 - 696
  • [35] Deformation behavior Of Mo5Si3 single crystal at high temperatures
    Yoshimi, K
    Yoo, MH
    Wereszczak, AA
    Borowicz, SM
    George, EP
    Miura, E
    Hanada, S
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2002, 329 : 228 - 234
  • [36] Elastic and thermal expansion anisotropy of Mo-based 5-3 silicides
    Hayashi, T
    Ito, K
    Takamoto, M
    Tanaka, K
    PRICM 5: THE FIFTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-5, 2005, 475-479 : 695 - 698
  • [37] INTEGRATED-INTENSITIES AND LATTICE-PARAMETERS FOR MO5SI3
    NAIDU, SVN
    MAYS, CF
    HOUSKA, CR
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1982, 65 (04) : C58 - C59
  • [38] High-temperature silicon diffusivities in Mo5Si3 and W5Si3 phases
    Kharatyan, SL
    Chatilyan, HA
    Harutyunyan, AB
    DIFFUSIONS IN MATERIALS: DIMAT2000, PTS 1 & 2, 2001, 194-1 : 1557 - 1562
  • [39] Mo5Si3 single crystals:: physical properties and mechanical behavior
    Chu, F
    Thoma, DJ
    McClellan, KJ
    Peralta, P
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1999, 261 (1-2): : 44 - 52
  • [40] Mo5Si3 single crystals: Physical properties and mechanical behavior
    Chu, F.
    Thoma, D.J.
    McClellan, K.J.
    Peralta, P.
    Materials Science and Engineering A, 1999, 261 (1-2): : 44 - 52