The Field Emission Properties of Graphene Aggregates Films Deposited on Fe-Cr-Ni alloy Substrates

被引：9
|
作者：
Lu, Zhanling [1 ]
Wang, Wanjie [1 ]
Ma, Xiaotian [1 ]
Yao, Ning [2 ]
Zhang, Lan [3 ]
Zhang, Binglin [3 ]
机构：
[1] Zhengzhou Univ, Sch Mat Sci & Engn, Zhengzhou 450001, Peoples R China
[2] Zhengzhou Univ, Dept Engn Mech, Zhengzhou 450001, Peoples R China
[3] Zhengzhou Univ, Educ Minist China, Mat Phys Lab, Zhengzhou 450052, Peoples R China
来源：
JOURNAL OF NANOMATERIALS | 2010年 / 2010卷
关键词：
D O I：
10.1155/2010/148596
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The graphene aggregates films were fabricated directly on Fe-Cr-Ni alloy substrates by microwave plasma chemical vapor deposition system (MPCVD). The source gas was a mixture of H-2 and CH4 with flow rates of 100 sccm and 12 sccm, respectively. The micro- and nanostructures of the samples were characterized by Raman scattering spectroscopy, field emission scanning electron microscopy (SEM), and transparent electron microscopy (TEM). The field emission properties of the films were measured using a diode structure in a vacuum chamber. The turn-on field was about 1.0 V/mu m. The current density of 2.1 mA/cm(2) at electric field of 2.4 V/mu m was obtained.
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页数：4
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