Plasma characteristics of the single loop antenna plasma source

被引：0
|
作者：
Takagi, K
Nakagawa, Y
Tsukada, T
机构：
来源：
PROCEEDINGS OF THE ELEVENTH INTERNATIONAL SYMPOSIUM ON PLASMA PROCESSING | 1996年 / 96卷 / 12期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：116 / 125
页数：10
相关论文
共 50 条
  • [31] Characterization of the slot antenna microwave plasma source
    Wu, CF
    Zhan, RJ
    Wen, XH
    Huang, WD
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2001, 29 (01) : 13 - 18
  • [32] Resonant planar antenna as an inductive plasma source
    Guittienne, Ph.
    Lecoultre, S.
    Fayet, P.
    Larrieu, J.
    Howling, A. A.
    Hollenstein, Ch.
    JOURNAL OF APPLIED PHYSICS, 2012, 111 (08)
  • [33] Theory of a Square Loop Antenna in an Anisotropic Magnetized Plasma
    Li, Zheng Xu
    Zeng, Hui Ran
    Li, Kai
    IEEE TRANSACTIONS ON ANTENNAS AND PROPAGATION, 2024, 72 (02) : 1250 - 1262
  • [34] Pulsed Radiation from a Loop Antenna in the Ionospheric Plasma
    Kudrin, Alexander V.
    Shmeleva, Natalya M.
    PROCEEDINGS OF THE FOURTH EUROPEAN CONFERENCE ON ANTENNAS AND PROPAGATION, 2010,
  • [35] Numerical Analysis of a Tunable Magnetized Plasma Loop Antenna
    Ghaderi, Mohammadreza
    Moradi, Gholamreza
    IEICE TRANSACTIONS ON COMMUNICATIONS, 2018, E101B (04) : 1055 - 1060
  • [36] POWER RADIATED BY A VLF LOOP ANTENNA IN THE IONOSPHERIC PLASMA
    FIALA, V
    TRISKA, P
    KRUCHINA, EN
    SHEVCHENKO, VI
    SOLOVIEV, GI
    SOTNIKOV, VI
    STUDIA GEOPHYSICA ET GEODAETICA, 1990, 34 (03) : 284 - 287
  • [37] Plasma and electrical characteristics depending on an antenna position in an inductively coupled plasma with a passive resonant antenna
    Kim, Ju Ho
    Chung, Chin-Wook
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2022, 31 (01):
  • [38] Characteristics of inductively coupled plasma(ICP) and helicon plasma in a singleloop antenna
    张天亮
    姜开银
    刘忠伟
    杨丽珍
    张海宝
    欧阳吉庭
    陈强
    Plasma Science and Technology, 2020, (08) : 137 - 145
  • [39] Characteristics of inductively coupled plasma(ICP) and helicon plasma in a singleloop antenna
    张天亮
    姜开银
    刘忠伟
    杨丽珍
    张海宝
    欧阳吉庭
    陈强
    Plasma Science and Technology, 2020, 22 (08) : 137 - 145
  • [40] Characteristics of plasma source for the plasma polishing of super smooth optics
    Wang, Dasen
    Liu, Weiguo
    Wu, Yilong
    Hang, Lingxia
    Yu, Huadong
    Jin, Na
    INTERNATIONAL CONFERENCE ON OPTICS IN PRECISION ENGINEERING AND NANOTECHNOLOGY (ICOPEN 2011), 2011, 19
12345