Plasma characteristics of the single loop antenna plasma source

被引：0
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作者：
Takagi, K
Nakagawa, Y
Tsukada, T
机构：
来源：
PROCEEDINGS OF THE ELEVENTH INTERNATIONAL SYMPOSIUM ON PLASMA PROCESSING | 1996年 / 96卷 / 12期
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
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页码：116 / 125
页数：10
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