Effects of antenna wavenumber spectrum and metal end plate on plasma characteristics excited by helicon wave

被引:17
|
作者
Shinohara, S [1 ]
Kaneda, N [1 ]
Kawai, Y [1 ]
机构
[1] Kyushu Univ, Interdisciplinary Grad Sch Engn Sci, Kasuga, Fukuoka 8168580, Japan
关键词
helicon wave; inductively coupled plasma; wavenumber spectrum; end plate;
D O I
10.1016/S0040-6090(98)00404-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Plasma performance excited by m = 0 helicon wave was investigated by the use of an antenna with one, two and four loops, changing the antenna wavenumber spectrum. It was found that the window to obtain a high density plasma, with a density of more than 10(13) cm(-3) in the RF power and filling pressure space became narrower when the low wavenumber spectrum part became smaller. However, in the high density region there was no clear relationship between the plasma density and this spectrum and the observed wavelength was determined by the helicon wave dispersion relation. A comparison with an inductively coupled plasma and the effect of the position of a metal end plate on the plasma characteristics are also presented. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:139 / 147
页数:9
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