Effects of antenna wavenumber spectrum and metal end plate on plasma characteristics excited by helicon wave

被引:17
|
作者
Shinohara, S [1 ]
Kaneda, N [1 ]
Kawai, Y [1 ]
机构
[1] Kyushu Univ, Interdisciplinary Grad Sch Engn Sci, Kasuga, Fukuoka 8168580, Japan
关键词
helicon wave; inductively coupled plasma; wavenumber spectrum; end plate;
D O I
10.1016/S0040-6090(98)00404-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Plasma performance excited by m = 0 helicon wave was investigated by the use of an antenna with one, two and four loops, changing the antenna wavenumber spectrum. It was found that the window to obtain a high density plasma, with a density of more than 10(13) cm(-3) in the RF power and filling pressure space became narrower when the low wavenumber spectrum part became smaller. However, in the high density region there was no clear relationship between the plasma density and this spectrum and the observed wavelength was determined by the helicon wave dispersion relation. A comparison with an inductively coupled plasma and the effect of the position of a metal end plate on the plasma characteristics are also presented. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:139 / 147
页数:9
相关论文
共 50 条
  • [1] Preparation of SOFC grown by helicon wave excited plasma sputtering - Energy control of helicon wave excited plasma
    Morimoto, K.
    Okayama, H.
    Nagata, A.
    Shinku/Journal of the Vacuum Society of Japan, 2001, 44 (05) : 539 - 543
  • [2] Etching characteristics in helicon wave plasma
    Kitagawa, Hideo
    Tsunoda, Akira
    Shindo, Haruo
    Horiike, Yasuhiro
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (01): : 11 - 13
  • [3] Characterisation of density linear control in a helicon plasma source with tunable antenna wavenumber spectra
    Zhu, Guanghui
    Li, Qing
    Zheng, Jiangshan
    Ying, Jiacheng
    Wang, Rongsheng
    Lu, Quanming
    Zhao, Xin
    Song, Shaodong
    Liu, Minsheng
    Sun, Xuan
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2021, 30 (07):
  • [4] Si oxynitridation with helicon-wave excited nitrogen plasma: Effects of plasma divergence and concentration on substrates
    Kimura, S
    Ito, T
    Tabakomori, M
    Okamoto, Y
    Ikoma, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (3B): : L316 - L319
  • [5] Si oxynitridation with Helicon-wave excited nitrogen plasma: effects of plasma divergence and concentration on substrates
    Science Univ of Tokyo, Chiba, Japan
    Jpn J Appl Phys Part 2 Letter, 3 B (L316-L319):
  • [6] DYNAMIC PLASMA BEHAVIOR EXCITED BY M=+/-1 HELICON WAVE
    SHINOHARA, S
    MIYAUCHI, Y
    KAWAI, Y
    PLASMA PHYSICS AND CONTROLLED FUSION, 1995, 37 (09) : 1015 - 1030
  • [7] Spectroscopy diagnosis of hydrogen plasma excited by helicon-wave
    Wang, Jia-Kou
    Wu, Wei-Dong
    Sun, Wei-Guo
    Deng, Hong-Yan
    Cheng, Xin-Lu
    Tang, Yong-Jian
    Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams, 2005, 17 (10): : 1513 - 1517
  • [8] Characteristics of inductively coupled plasma(ICP) and helicon plasma in a singleloop antenna
    张天亮
    姜开银
    刘忠伟
    杨丽珍
    张海宝
    欧阳吉庭
    陈强
    Plasma Science and Technology, 2020, (08) : 137 - 145
  • [9] Characteristics of inductively coupled plasma(ICP) and helicon plasma in a singleloop antenna
    张天亮
    姜开银
    刘忠伟
    杨丽珍
    张海宝
    欧阳吉庭
    陈强
    Plasma Science and Technology, 2020, 22 (08) : 137 - 145
  • [10] Sputtering effects in a helicon plasma with an additional immersed antenna
    Aanesland, A
    Charles, C
    Boswell, RW
    Fredriksen, Å
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2003, 12 (01): : 85 - 88