Comparison of the electronic structures of AIN nanotips grown on p- and n-type Si substrates

被引:8
|
作者
Chiou, JW
Tsai, HM
Pao, CW
Dong, CL
Chang, CL
Chien, FZ
Pong, WF [1 ]
Tsai, MH
Shi, SC
Chen, CF
Chen, LC
Chen, KH
Hong, IH
Chen, CH
Lin, HJ
Guo, JH
机构
[1] Tamkang Univ, Dept Phys, Taipei 251, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 804, Taiwan
[3] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan
[4] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 106, Taiwan
[5] Acad Sinica, Inst Atom & Mol Sci, Taipei 106, Taiwan
[6] Natl Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan
[7] Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA
关键词
D O I
10.1088/0953-8984/17/48/006
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
At and N K-edge x-ray absorption near-edge structure (XANES), scanning photoelectron microscopy (SPEM) and x-ray emission measurements were performed on AIN nanotips grown on p- and n-type Si substrates (p-AIN and n-AIN). Features and intensities in the Al and N K-edge XANES spectra of these AIN nanotips overall are similar. In contrast, the intensities of the valence-band SPEM spectra of p-AIN are apparently larger than those of n-AIN, which indicates that the valence-band density of states of p-AIN exceeds that of n-AIN. This result may be related to the observed enhancement of field-emission intensity of AIN nanotips grown on the p-type Si substrate.
引用
收藏
页码:7523 / 7530
页数:8
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