Application of cobalt salicide in sub-quarter micron ULSI

被引：0
|
作者：
Bai, G [1 ]
Stivers, A [1 ]
机构：
[1] INTEL CORP,SANTA CLARA,CA
来源：
SILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS | 1996年 / 402卷
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：215 / 220
页数：6
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