RRAM;
resistive switching mechanism;
stochastic model;
Monte Carlo method;
CURRENT-VOLTAGE CHARACTERISTICS;
RESISTANCE;
D O I:
暂无
中图分类号:
TP39 [计算机的应用];
学科分类号:
081203 ;
0835 ;
摘要:
A microscopic model of the resistive switching mechanism in bipolar metal-oxide based resistive random access memory (RRAM) is presented. The distribution of electron occupation probabilities obtained is in agreement with previous work. In particular, a low occupation region is formed near the cathode. A hysteresis cycle of RRAM switching simulated with the model including the ion dynamics is in good agreement with experimental results.
机构:
Hanyang Univ, Res Inst Ind Sci, Seoul 04763, South Korea
Hanyang Univ, Div Mat Sci & Engn, Seoul 133791, South KoreaShiraz Univ Technol, Dept Mat Sci & Engn, Shiraz 71555713876, Iran