Electromechanical testing of ZnO thin films under high uniaxial strain

被引:0
|
作者
Tuyaerts, Romain [1 ,2 ]
Raskin, Jean-Pierre [1 ]
Proost, Joris [2 ]
机构
[1] Catholic Univ Louvain, Inst Informat & Commun Technol Elect & Appl Math, B-1348 Louvain, Belgium
[2] Catholic Univ Louvain, Inst Mech Mat & Civil Engn, B-1348 Louvain, Belgium
来源
2017 INTERNATIONAL CONFERENCE OF MICROELECTRONIC TEST STRUCTURES (ICMTS) | 2017年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thanks to an innovative design, stress-strain curves of released thin films can be obtained, from zero stress up to the tensile fracture stress of the material, using internal stress present in a second material. This second material acts as an actuator that pulls on the sample when released from the substrate, allowing to apply a stress on the tested material. This technique has also been used to make electrical resistivity measurements under deformation to extract piezoresistive coefficients and can be extended to perform Hall measurements to measure charge carriers density and mobility as well as the resistivity.
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页数:4
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