An integrated tunable band-pass filter using MEMS parallel-plate variable capacitors implemented with 0.35μm CMOS technology

被引:18
|
作者
Fouladi, S. [1 ]
Bakri-Kassem, M. [1 ]
Mansour, R. R. [1 ]
机构
[1] Univ Waterloo, Waterloo, ON N2L 3G1, Canada
关键词
CMOS; Integrated tunable filters; microelectromechanical devices; RF MEEMS; tunable capacitors;
D O I
10.1109/MWSYM.2007.380518
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents an integrated tunable bandpass filter with RF MENIS varactors fabricated using the TSMC 0.35 mu m CMOS process. A maskless post-processing technique is developed which enables the fabrication of RF MENIS parallel-plate capacitors with a high quality factor and a very compact size. A 2-pole coupled line tunable bandpass filter with a center frequency of 9.5GRz and a 9% relative bandwidth is designed, fabricated and tested. A tuning range of 17% is achieved using integrated variable MENIS capacitors with a quality factor exceeding 20. The filter has an insertion loss of 5.66dB and occupies a chip area of 1.2 x 2.1 mm(2).
引用
收藏
页码:505 / 508
页数:4
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