anisotropy;
Co-alloy thin films;
electron diffraction;
magnetic recording;
stacking faults;
TEM;
D O I:
10.1109/20.950869
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Stacking faults in (10 (1) over bar0) unicrystal Co and Co-alloy thin films have been analyzed by the electron diffraction technique. As predicted no diffraction contrast of stacking faults could be observed when the beam is parallel to the [10 (1) over bar0] direction. However, both by plan-view TEM observation and electron diffraction along the [11 (2) over bar0] direction reveal that the stacking fault density in biased pure Co (10 (1) over bar0) thin films is much lower than that in unbiased ones. The addition of Cr in Co films significantly reduces stacking fault density whereas the addition of 8at% Pt leads to a considerable increase in stacking fault density. Our results show that stacking faults in Co thin films significantly, and negatively, affect the anisotropy energy density and its temperature dependence.
机构:
Hitachi Ltd, Informat Storage Dept, Cent Res Lab, Kokubunji, Tokyo 1858601, JapanHitachi Ltd, Informat Storage Dept, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan
Futamoto, M
Terayama, K
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机构:Hitachi Ltd, Informat Storage Dept, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan
Terayama, K
Sato, K
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机构:Hitachi Ltd, Informat Storage Dept, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan
Sato, K
Hirayama, Y
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机构:Hitachi Ltd, Informat Storage Dept, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan
机构:
Tohoku Univ, Dept Elect Engn, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Elect Engn, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
Hinata, Shintaro
Yanagisawa, Ryuichi
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Tohoku Univ, Dept Elect Engn, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Elect Engn, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
Yanagisawa, Ryuichi
Saito, Shin
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Tohoku Univ, Dept Elect Engn, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Elect Engn, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
Saito, Shin
Takahashi, Migaku
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机构:
Tohoku Univ, New Ind Creat Hatchery Ctr, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Elect Engn, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan