Obtaining S-phase layer: Glow-discharge nitriding at low temperature x SHTPN - Part 2

被引：3

作者：

dos Reis, Ricardo Fernando ^{[1
]}

Durante, Gabriela Costa ^{[2
]}

机构：

[1] UTFPR, Dept Acad Mecan, BR-80230901 Curitiba, Parana, Brazil

[2] Bolsista UTFPR Brasil, Brasilia, DF, Brazil

来源：

MATERIA-RIO DE JANEIRO | 2015年 / 20卷 / 02期

关键词：

Plasma nitriding; SHTPN; S-phase; ISO; 5832-1; corrosion; STAINLESS-STEEL; CORROSION BEHAVIOR; NITROGEN;

D O I：

10.1590/S1517-707620150002.0032

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Samples of austenitic stainless steel ISO 5832-1 showing nitrogen-rich surface layer (S-phase), obtained by plasma nitriding at low temperature and SHTPN (Solution Heat Treatment after Plasma Nitriding) processes, characterized in previous work, and samples in starting microstructure, in other words, solubilized and plasma samples nitrided at 750 degrees C for 3 hours, were tested for corrosion resistance. The corrosion resistance was evaluated based on the potentiodynamic anodic polarization test and open circuit measurements of corrosion potential (OCP) using 0.5 M NaCl. The results confirmed the gain in localized corrosion resistance from the nitrogen in solid solution in both low-temperature nitriding and SHTPN process, as well as from the deleterious effect of precipitation of chromium nitride.

引用

页码：316 / 321

页数：6

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