Atomic layer deposition chemistry:: Recent developments and future challenges

被引：931
|
作者：
Leskelä, M [1 ]
Ritala, M [1 ]
机构：
[1] Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland
来源：
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2003年 / 42卷 / 45期
关键词：
atomic layer deposition; microelectronics; nitrides; oxides; thin films;
D O I：
10.1002/anie.200301652
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：5548 / 5554
页数：7
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