First demonstration of X-ray mirrors using focused ion beam

被引：8

作者：

Numazawa, Masaki ^{[1
]}

Ezoe, Yuichiro ^{[1
]}

Ishikawa, Kumi ^{[2
]}

Ogawa, Tomohiro ^{[1
]}

Sato, Mayu ^{[1
]}

Nakamura, Kasumi ^{[1
]}

Takeuchi, Kazuma ^{[1
]}

Terada, Masaru ^{[1
]}

Ohashi, Takaya ^{[1
]}

Mitsuda, Kazuhisa ^{[3
]}

Kelley, Ron ^{[4
]}

Murata, Kaoru ^{[5
]}

机构：

[1] Tokyo Metropolitan Univ, Hachioji, Tokyo 1920397, Japan

[2] RIKEN, 2-1 Hirosawa, Wako, Saitama 3510198, Japan

[3] JAXA, ISAS, Sagamihara, Kanagawa 2525210, Japan

[4] FEI Co, Hillsboro, OR 97124 USA

[5] FEI Japan NanoPort, Minato Ku, Tokyo 1080075, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2016年 / 55卷 / 06期

关键词：

SILICON-WAFERS; OPTICS;

D O I：

10.7567/JJAP.55.06GP11

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on novel X-ray mirrors fabricated with a focused ion beam for future astronomical missions. We fabricated a test sample from a silicon wafer by forming six slits whose sidewalls were used as X-ray reflection surfaces. The six slits were designed with a size of 25 x 300 x 170 mu m(3) and with different inclination angles of 0 and +/- 1 degrees. We examined X-ray reflection using three slits with different inclination angles at Al K alpha 1.49 keV. Consequently, we demonstrated X-ray reflection from all the three slits. All the sidewalls have multiangular components with a microroughness of similar to 1 nm rms. similar to 30-45% of the total surface area is effective for X-ray reflection. We confirmed that the inclination angles are consistent with the designed values. (C) 2016 The Japan Society of Applied Physics

引用

页数：5

共 50 条

[41] Ion beam assisted deposition of multi-layer X-ray mirrors for the extreme ultraviolet lithography
Chassé, T
Neumann, H
Rauschenbach, B
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 : 377 - 381
[42] X-ray nano computerised tomography of SOFC electrodes using a focused ion beam sample-preparation technique
Shearing, P. R.
Gelb, J.
Brandon, N. P.
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2010, 30 (08) : 1809 - 1814
[43] Development of an Ion Beam Sputter Deposition System for Producing Complex-Shaped X-ray Mirrors
Motoyama, Hiroto
Nagayama, Mitsuru
Mimura, Hidekazu
18TH CIRP CONFERENCE ON ELECTRO PHYSICAL AND CHEMICAL MACHINING (ISEM XVIII), 2016, 42 : 512 - 515
[44] X-ray measurements using a microcalorimeter on an electron beam ion trap
Silver, E.
Chen, Gx
Kirby, K.
Brickhouse, N. S.
Gillaspy, J. D.
Tan, J. N.
Pomeroy, J. M.
Laming, J. M.
ATOMIC PROCESSES IN PLASMAS, 2007, 926 : 79 - 79
[45] MULTILAYER X-RAY MIRRORS
KOZHEVNIKOV, IV
VINOGRADOV, AV
JOURNAL OF RUSSIAN LASER RESEARCH, 1995, 16 (04) : 343 - 385
[46] Foil X-ray mirrors
Serlemitsos, PJ
Soong, Y
ASTROPHYSICS AND SPACE SCIENCE, 1996, 239 (02) : 177 - 196
[47] TECHNIQUES AND LABORATORY APPLICATIONS FOR FOCUSED BEAM X-RAY DIFFRACTION
Loxley, N.
Bowen, D. K.
Fraser, G.
Taylor, M.
Wall, J.
Pina, L.
Inneman, A.
Hudec, R.
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 1999, 55 : 178 - 179
[48] Potential for Focused Low Energy X-Ray Beam for Therapy
Abbas, H.
Mahato, D.
Satti, J.
MacDonald, C.
MEDICAL PHYSICS, 2012, 39 (06) : 3859 - 3859
[49] Lithography with a focused soft X-ray beam and a monomolecular resist
Klauser, R
Huang, ML
Wang, SC
Chen, CH
Chuang, TJ
Terfort, A
Zharnikov, M
LANGMUIR, 2004, 20 (06) : 2050 - 2053
[50] AN X-RAY MICROSCOPE USING MIRRORS OF ADJUSTABLE CURVATURE
LUCHT, CM
HARKER, D
REVIEW OF SCIENTIFIC INSTRUMENTS, 1951, 22 (06): : 392 - 395

← 1 2 3 4 5 →