In situ measurements of optical film parameters and plasma monitoring during reactive sputtering for advanced in-line process control

被引：3

作者：

Richter, U. ^{[1
]}

Hentsch, W. ^{[2
]}

Liepack, H. ^{[2
]}

Kruse, R. ^{[3
]}

Dittrich, R. ^{[4
]}

机构：

[1] SENTECH Instruments GmbH, D-12489 Berlin, Germany

[2] FHR Anlagenbau GmbH, D-01458 Ottendorf Okrilla, Germany

[3] Steag ETA Opt GmbH, D-52525 Heinsberg, Germany

[4] IfU GmbH, D-09244 Gottfried Schenker, Germany

来源：

THIN SOLID FILMS | 2008年 / 516卷 / 14期

关键词：

inline; ellipsometry; reflectometry; sputtering;

D O I：

10.1016/j.tsf.2007.05.094

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work the spectroscopic ellipsometry and the reflectometry/transmission measurements together with an advanced plasma monitor were used for inline measurements. All systems were installed in an inline sputtering equipment which enables a continuous deposition process-the condition for a direct feedback to the deposition parameters. The metrology tools were connected by a framework software which used an XML over TCP/IP connection. The setup allowed to control the multilayer deposition using a deposition script and to use the metrology tools for measuring the thicknesses and to correct the deposition rates. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：4541 / 4545

页数：5