Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks

被引：0

作者：

Carbajo, S. ^{[1
,2
]}

Brizuela, F. ^{[1
,2
]}

Martz, D. H. ^{[1
,2
]}

Alessi, D. ^{[1
,2
]}

Wang, Y. ^{[1
,2
]}

Marconi, M. C. ^{[1
,2
]}

Rocca, J. J. ^{[1
,2
]}

Menoni, C. S. ^{[1
,2
]}

Sakdinawat, A. ^{[3
,4
]}

Anderson, E. ^{[3
,4
]}

Goldberg, K. A. ^{[3
,4
]}

Attwood, D. T. ^{[3
,4
]}

La Fontaine, B. ^{[5
]}

机构：

[1] Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA

[2] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[3] Univ Calif Berkeley, NSF ERC Extreme Ultraviolet Sci & Technol, Berkeley, CA 94720 USA

[4] Univ Calif Berkeley, Ctr Xray Opt, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA

[5] GLOBALFOUNDRIES, Sunnyvale, CA 94085 USA

来源：

2010 23RD ANNUAL MEETING OF THE IEEE PHOTONICS SOCIETY | 2010年

基金：

美国国家科学基金会;

关键词：

D O I：

10.1109/PHOTONICS.2010.5699022

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have developed a compact aerial full-field microscope based on a table-top 13.2 nm wavelength extreme ultraviolet laser and diffractive optics to characterize the printing performance of EUV lithographic masks.

引用

页码：584 / +

页数：2

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