Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks

被引：0
|
作者：
Carbajo, S. [1 ,2 ]
Brizuela, F. [1 ,2 ]
Martz, D. H. [1 ,2 ]
Alessi, D. [1 ,2 ]
Wang, Y. [1 ,2 ]
Marconi, M. C. [1 ,2 ]
Rocca, J. J. [1 ,2 ]
Menoni, C. S. [1 ,2 ]
Sakdinawat, A. [3 ,4 ]
Anderson, E. [3 ,4 ]
Goldberg, K. A. [3 ,4 ]
Attwood, D. T. [3 ,4 ]
La Fontaine, B. [5 ]
机构：
[1] Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
[2] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA
[3] Univ Calif Berkeley, NSF ERC Extreme Ultraviolet Sci & Technol, Berkeley, CA 94720 USA
[4] Univ Calif Berkeley, Ctr Xray Opt, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
[5] GLOBALFOUNDRIES, Sunnyvale, CA 94085 USA
来源：
2010 23RD ANNUAL MEETING OF THE IEEE PHOTONICS SOCIETY | 2010年
基金：
美国国家科学基金会;
关键词：
D O I：
10.1109/PHOTONICS.2010.5699022
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We have developed a compact aerial full-field microscope based on a table-top 13.2 nm wavelength extreme ultraviolet laser and diffractive optics to characterize the printing performance of EUV lithographic masks.
引用
收藏
页码：584 / +
页数：2
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