Magnetic and electronic transport properties of antiperovskite Mn3Cu(Ge)N thin films

被引:3
|
作者
Na, Yuanyuan [1 ]
Wang, Cong [1 ]
Chu, Lihua [1 ]
Ding, Lei [1 ]
Ji, Nian [2 ]
Wang, Jian-ping [2 ]
Chen, Xiaolong [3 ]
机构
[1] Beihang Univ, Ctr Condensed Matter & Mat Phys, Key Lab Micronaro Measurement Manipulat & Phys, Beijing 100191, Peoples R China
[2] Univ Minnesota, Ctr Micromagnet & Informat Technol, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA
[3] Chinese Acad Sci, Inst Phys, Beijing 100191, Peoples R China
基金
美国国家科学基金会; 中国国家自然科学基金;
关键词
Thin films; Sputtering; Electrical properties;
D O I
10.1016/j.matlet.2011.05.040
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The antiperovskite structure Mn3Cu(Ge)N thin films were grown on single crystal Si (100) substrates by facing target magnetron sputtering. It is found that the films exhibit (100) preferred orientation. Ge-doping does not change the antiperovskite structure but leads to obvious changes in surface morphologies, magnetic and electronic transport properties. As a function of temperature, the resistivity of the films shows a semiconductor-type behavior. Moreover, it is worth noting that an abrupt change of resistivity is observed and magnetic ordering of the films changes from ferrimagnetic (FI) to antiferromagnetic (AFM) due to Ge-doping. In addition, both the transition temperature (T-t) and Neel temperature (T-N) move towards higher temperature with increasing Ge content. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:2401 / 2403
页数:3
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