Improved arrayed-waveguide-grating layout avoiding systematic phase errors

被引：25

作者：

Ismail, Nur ^{[1
]}

Sun, Fei ^{[1
]}

Sengo, Gabriel ^{[1
]}

Worhoff, Kerstin ^{[1
]}

Driessen, Alfred ^{[1
]}

de Ridder, Rene M. ^{[1
]}

Pollnau, Markus ^{[1
]}

机构：

[1] Univ Twente, Integrated Opt MicroSyst Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands

来源：

OPTICS EXPRESS | 2011年 / 19卷 / 09期

关键词：

DESIGN;

D O I：

10.1364/OE.19.008781

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a detailed description of an improved arrayed-waveguide-grating (AWG) layout for both, low and high diffraction orders. The novel layout presents identical bends across the entire array; in this way systematic phase errors arising from different bends that are inherent to conventional AWG designs are completely eliminated. In addition, for high-order AWGs our design results in more than 50% reduction of the occupied area on the wafer. We present an experimental characterization of a low-order device fabricated according to this geometry. The device has a resolution of 5.5 nm, low intrinsic losses (< 2 dB) in the wavelength region of interest for the application, and is polarization insensitive over a wide spectral range of 215 nm. (C)2011 Optical Society of America

引用

页码：8781 / 8794

页数：14

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